This file type includes high-resolution graphics and schematics when applicable. Michael White, Director of Product Marketing, Calibre Physical Verification products, Mentor Graphics In recent years, ...

Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...

First order process modeling can help tremendously with process setup and integration challenges that occur in a semiconductor fabrication flow, by visualizing process variation problems “virtually” ...

Some of the tools you use in building applications also apply as you build out your services. The Single Responsibility Principle (SRP), for example, makes as much sense at the service level as it ...

Design patterns constitute a fundamental component in the architecture of software systems, providing standardised and reusable solutions to recurring design challenges. Originating from seminal works ...

Design patterns are proven solutions to common software design problems. They provide the correct and tested solution for what is often encountered while designing software applications. The ...